I have been working on wetting behavior of (1,0,0) silicon surface. I am using Weber potential for Si and Mixing rule for interaction parameters of Si-SPC/e water. I have some trouble to find experimental results for contact angle of bare Silicon surface. Since a thin layer of silicon dioxide forms on the surface when silicon is exposed to the ambient air, it is not easy to both obtain and maintain a bare Silicon surface. Expected behavior of Silicon with oxide layer is hydrophilic while the pure silicon is hydrophobic. Published results show big diversion even though everyone claims that the Si surface is cleaned properly by etching.