Dear :
I am simulating a thermal resistance between the Si and Ge.The MP method is used in my model.I created the initiating structure in lammps .The input deck is below. In the relaxation process,first I ran the system in NPT 500000 steps. Second I ran the system langevin+nve 500000 steps .At last I ran the nve 100000 steps .However,I found the temperature continues increasing .Why ? Is my initiating structure wrong? Thank you very much !
I 'm very grateful!
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units metal
boundary p p p
atom_style atomic
newton on
neighbor 2 bin
neigh_modify every 1 delay 0 check yes
lattice diamond 5.657
region md block -100 100 -12.5 12.5 -12.5 12.5 units box
create_box 2 md
region Geregion block -50 50 INF INF INF INF units box
create_atoms 2 region Geregion
lattice none
lattice diamond 5.431
region Siregion1 block INF -51 INF INF INF INF units box
region Siregion2 block 51 INF INF INF INF INF units box
region Siregion union 2 Siregion1 Siregion2
create_atoms 1 region Siregion
pair_style tersoff
pair_coeff * * SiCGe.tersoff Si(D) Ge
mass 1 28.0855
mass 2 72.64
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