About the study of plasma etching silicon nitride topography

I want to use lammps to study the plasma etching Si3N4 topography, I need a more accurate SW or Tersoff potential function file, I hope someone can help me, thank you very much

That hope has very little ground to stand on, when I look at similar posts in the past.

The vast majority of the people that respond here do not work on creating force field parameters, and those who do, don’t work on the kind of potentials that you are interested in.

The way to get better / other potentials is to a) thoroughly search the published literature for publications performing similar calculations to yours on similar systems so you can look up and test the potentials they were using, or b) find a collaborator with experience in parameterizing force fields of the kind you are looking into, or c) teach yourself how to parameterize potentials.