I try the bench/in.eam to check the result between these eam/opt and eam and I get the same result exactly.
Because I simulate the process of thin film deposition and I modified the code to perform deposition. In order to prevent the code I modified contain some error. So I try the default command: "fix_deposite" to simulate deposition. At the first it shows the same value but after 8000 timesteps I get different result of the "Temp E_pair E_mol TotEng Press".
Because the difference are not very large for these two case.So I was wondering if this will affect the behavior of the simulation or I can neglect the different.
Thanks for your suggestion.
Here is the input for origal EAM