Hello everyone,
I am running a sputter deposition simulation, but I am not seeing the film to grow. Looking fro some suggestions.
It deposited about 1500 particles and then slows down, I am running this for a while.
What is the right “fix deposit” argument that I should use.
I was trying “target”, “local” but cannot see the film growing.
As lammps document says "target " is most appropriate for sputter deposition, where should I put the target ? on the surface of the substrate, or away from the surface ? because as film grows the depositing atoms will hit those atoms on the target and may not allow the film to grow.
Set up :
pair_style airebo 3.0 1 1
pair_coeff * * …/lammps-31Jul12/potentials/CH.airebo C
region fixlayer block INF INF INF INF 0 10.0 units box
region thermolayer block INF INF INF INF 10.5 60.0 units box
region sputter1 block 0.0 43.32 0.0 43.32 61.5 216.0 side in units box
group disk region sputter1
timestep 0.0005
#fix 6 disk deposit 4000 1 1000 12345 region sputter1 vz -200.5 -200.5 local 1.0 1.0 1.0 near 2.0 units box #fix 6 disk deposit 4000 1 5000 12345 region sputter1 vz -200.5 -200.5 near 2.0 target 20.0 20.0 100.55 units box #fix 6 disk deposit 10000 1 8000 12345 region sputter1 vz -200.5 -200.5 target 20.0 20.0 85.00 units box
fix 6 disk deposit 10000 1 8000 12345 region sputter1 vz -200.5 -200.5 local 1.0 1.0 1.0 units box
fix 7 all temp/rescale 100 300 300 10 0.5
run 100000000
write_restart
Hello everyone,
I am running a sputter deposition simulation, but I am not seeing the film
to grow. Looking fro some suggestions.
It deposited about 1500 particles and then slows down, I am running this for
a while.
What is the right "fix deposit" argument that I should use.
I was trying "target", "local" but cannot see the film growing.
As lammps document says "target " is most appropriate for sputter
deposition, where should I put the target ? on the surface of the substrate,
or away from the surface ? because as film grows the depositing atoms will
hit those atoms on the target and may not allow the film to grow.
you are not making sense. whether atoms will be deposited or not
depends on 1) how strongly they interact with the substrate and 2) how
large a kinetic energy they have.
Set up :
pair_style airebo 3.0 1 1
pair_coeff * * ../lammps-31Jul12/potentials/CH.airebo C
region fixlayer block INF INF INF INF 0 10.0 units box
region thermolayer block INF INF INF INF 10.5 60.0 units box
region sputter1 block 0.0 43.32 0.0 43.32 61.5 216.0 side in units box
group disk region sputter1
timestep 0.0005
#fix 6 disk deposit 4000 1 1000 12345 region sputter1 vz -200.5 -200.5
local 1.0 1.0 1.0 near 2.0 units box #fix 6 disk deposit 4000 1 5000 12345 region sputter1 vz -200.5 -200.5
near 2.0 target 20.0 20.0 100.55 units box #fix 6 disk deposit 10000 1 8000 12345 region sputter1 vz -200.5
-200.5 target 20.0 20.0 85.00 units box
fix 6 disk deposit 10000 1 8000 12345 region sputter1 vz -200.5 -200.5
local 1.0 1.0 1.0 units box
fix 7 all temp/rescale 100 300 300 10 0.5
now this command is an extremely bad choice in too many ways. this
makes no sense at all. think about it for a while.